Ceramics Products

TaC Coated Graphite Heater

For High Temperature Thin Film Deposition Equipment

Momentive Quartz Technologies Inc offers high temperature resistive or inductive heaters with a proprietary coating known as Tantalum Carbide (TaC). With its high temperature stability and high chemical resistance, TaC coated graphite heater provides a more robust heating solution that enhances the life of heaters in harsh environment, reduces equipment maintenance cycle/cost, and increase production yield.

Key Features

  • Temperature stability > 2200 °C
  • Ultra high purity
  • Hard coat with low particle release
  • Resistance to H2, NH3, SiH4, CH4
  • Resistance to thermal stock
  • Stable hot electrical resistance
  • Robust electrical contact
  • Conformal coating coverage
  • Strong adhesive to graphite
  • Simple 1D to complex 3D shapes

Potential Applications

  • Resistive heating coil
  • CVD hot filament
  • Inductive heating plate
  • Inductive heating cylinder

TaC Coating with High Crystallinity and Excellent Uniformity

TaC-Coating-with-High-Crystallinity-and-Excellent-Uniformity 10µm
10µm
TaC-Coating-with-High-Crystallinity-and-Excellent-Uniformity 300µm
300µm

IR and Optical Image of TaC Heater at 1100°C

TaC Hot Filament Thermal Cycled to 2000°C at Rate 1000°C/min

Typical Property Comparison of TaC and SiC Coatings

Density (gm/cm3) Emissivity(1) CTE (x10-6/K) Hardness (HK) Resistance (Ohm-cm) Thermal Stability Etch Rate(2) in NH3 (μm/hr) Etch Rate(3) in H2 (μm/hr) Thickness Variation
TaC
14.3
0.3
6.3
2000
1x10-5
>2200 °C
0.2
0.1
~5%
SiC
3.2
0.8
4.5
2800
2x10-3
<1600 °C
1.5
1.7
~10%

Note: Test data. Actual results may vary.
Typical properties are average data and are not to be used as or to develop specifications.
(1) Emissivity is measured at 950nm and 1000 °C.
(2) Etch rate in NH3 is measured at 1400 °C and 500 Torr.
(3) Etch rate in H2 is measured at 1400 °C and 760 Torr.

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TaC Heaters

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TaC Heaters

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台湾办事处

No. 6, 10th Floor, No. 65, Gaotie 7th Road, Zhubei City, Hsinchu, Taiwan

中国办事处

No. 1088 Yuanshen road, Suite 1101 Ping’an Fortune Building, Shanghai 200122, China

+86 21 5848 1388

한국사무소

Momentive Technologies Korea Ltd.

7F of WONIK Building, 20, Pangyo-ro 255beon-gil, Bundang-gu, Seongnam-si, Gyeonggi-do,
Republic of Korea

+82 31 8038 9069

日本オフィス

Momentive Technologies Japan KK

Park West 10th floor, 6-12-1, Nishi-Shinjuku, Shinjuku-ku, Tokyo 1600023,
Japan

+81 3 6721 1910